ECE 510

fall 2013
 
All Classes
Micro and Nanolithography

Credit: 4 hours.

Comprehensive foundation in the broad field of micro and nanolithography; the science of optical imaging, photochemistry, and materials issues; technological developments including state-of-the-art commercial lithography systems. Applications of micro and nanolithography to diverse fields including: semiconductor devices, displays, flexible electronics, microelectromechanical systems, and biotechnology. Prerequisite: One of ECE 444, ECE 460, MSE 462, NPRE 429, PHYS 402.

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