ECE 444
Spring 2018 Part of Term 1
Jan 16-May 2
Credit: 4 hours.
Fabrication lab emphasizing physical theory and design of devices suitable for integrated circuitry; electrical properties of semiconductors and techniques (epitaxial growth, oxidation, photolithography diffusion, ion implantation, metallization, and characterization) for fabricating integrated circuit devices such as p-n junction diodes, bipolar transistors, and field effect transistors.
4 undergraduate hours. 4 graduate hours. Prerequisite: ECE 340.
| CRN | Type | Section | Time | Day | Location | Instructor | Section Details | |
|---|---|---|---|---|---|---|---|---|
|
33902
|
Laboratory
|
AB1
|
9:00AM
-11:50AM
|
T
|
Micro & Nanotechnology Lab
|
Li, X
|
|
|
|
33903
|
Laboratory
|
AB2
|
2:00PM
-4:50PM
|
T
|
Micro & Nanotechnology Lab
|
Li, X
|
|
|
|
33904
|
Laboratory
|
AB3
|
9:00AM
-11:50AM
|
R
|
Micro & Nanotechnology Lab
|
Li, X
|
|
|
|
33905
|
Laboratory
|
AB4
|
2:00PM
-4:50PM
|
R
|
Micro & Nanotechnology Lab
|
Li, X
|
|
|
|
33906
|
Laboratory
|
AB5
|
2:00PM
-4:50PM
|
M
|
Micro & Nanotechnology Lab
|
Li, X
|
|
|
|
33907
|
Laboratory
|
AB6
|
2:00PM
-4:50PM
|
W
|
Micro & Nanotechnology Lab
|
Li, X
|
|
|
|
33908
|
Laboratory
|
AB7
|
2:00PM
-4:50PM
|
F
|
Micro & Nanotechnology Lab
|
Li, X
|
|
|
|
33900
|
Discussion/
Recitation |
AD1
|
9:00AM
-9:50AM
|
MWF
|
Electrical & Computer Eng Bldg
|
Li, X
|
|
|
|
33901
|
Discussion/
Recitation |
AD2
|
10:00AM
-10:50AM
|
MWF
|
Electrical & Computer Eng Bldg
|
Sievers, D
|
|