ECE 510
Fall 2010 All Classes
All Classes
Credit: 4 hours.
A comprehensive foundation in the broad field of micro and nanolithography, including the science of optical imaging, photochemistry, and materials issues; technological developments including state-of-the-art commercial lithography systems; applications of micro and nanolithography to diverse fields, including semiconductor devices, displays, flexible electronics, microelectromechanical systems, and biotechnology.
Prerequisite: One of ECE 444, ECE 460, MSE 462, NPRE 429, PHYS 402.
Section Status updates every 10 minutes.
| CRN | Type | Section | Time | Day | Location | Instructor | Section Details | |
|---|---|---|---|---|---|---|---|---|
|
53799
|
Lecture
|
A
|
11:00AM
-12:20PM
|
TR
|
Everitt Laboratory
|
Jain, K
|
|