ECE 510
Micro and Nanolithography
Credit: 4 hours.
A comprehensive foundation in the broad field of micro and nanolithography, including the science of optical imaging, photochemistry, and materials issues; technological developments including state-of-the-art commercial lithography systems; applications of micro and nanolithography to diverse fields, including semiconductor devices, displays, flexible electronics, microelectromechanical systems, and biotechnology. Prerequisite: One of ECE 444, ECE 460, MSE 462, NPRE 429, PHYS 402.
| CRN | Type | Section | Time | Days | Location | Instructor |
|---|---|---|---|---|---|---|
| 53799 | lecture | A | 11:00 AM - 12:20 PM | TR | room 57 Everitt Elec and Comp Engr Lab | Jain, K |
| Restricted to Graduate - Urbana-Champaign. 4 hours | ||||||